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Date

SPIE Photomask Technology + EUV Lithography

September 08, 2026 - September 11, 2026

SPIE Photomask Technology + EUV Lithography: Pioneering the Future of Microelectronics

The SPIE Photomask Technology + EUV Lithography event stands as the leading global trade fair and conference for photomasks, extreme ultraviolet (EUV) lithography, and associated processes. Bringing together experts from industry and academia, the fair serves as a pivotal platform for exchanging knowledge, discussing challenges, and exploring the latest innovations in the semiconductor and microelectronics sectors.

Organized annually by the International Society for Optics and Photonics (SPIE), the event is held at the Monterey Marriott in Monterey, California. Its convenient location and high-quality facilities provide an ideal environment for focused professional engagement and networking.

Exploring Cutting-Edge Photomask and Lithography Technologies

The exhibition and conference cover a broad range of technologies central to the photomask and lithography industry. Key topics include:

Mask technologies: inspection, repair, and metrology systems

Cleaning technologies to ensure precision and defect-free production

EUV lithography and advanced nanoimprint techniques

Direct-write techniques and wafer processing solutions

Simulation software, resists, substrates, and etching materials

This extensive coverage ensures that attendees gain a comprehensive view of the industry’s current capabilities, trends, and future directions.

Highlighting Innovation and Research

SPIE Photomask Technology + EUV Lithography emphasizes both technological innovation and research excellence. Among the event’s most notable features:

BACUS Awards, recognizing outstanding achievements and contributions to the photomask industry

Special student zones and courses, designed to nurture emerging talent in microelectronics and nanotechnology

Technical presentations and workshops, providing deep insights into cutting-edge research and industrial applications

By combining practical demonstrations, academic insights, and award recognition, the event fosters collaboration between companies, researchers, and students alike.

Who Attends and Why It Matters

The fair attracts a highly specialized audience, including professionals from:

Microelectronics and semiconductor industries

Nanotechnology research and applications

Photomask manufacturing and equipment supply

Academic institutions and research laboratories

Attendees benefit from opportunities to connect with leading companies, discover innovative tools and services, and stay informed about market trends and emerging challenges. For students and young professionals, the event provides unique access to mentorship, technical courses, and industry recognition through awards and presentations.

Networking and Knowledge Exchange

The combination of exhibition space, technical sessions, and interactive workshops encourages meaningful interactions and business development. Participants can:

Evaluate the latest photomask and lithography technologies firsthand

Participate in technical workshops led by industry leaders

Establish strategic partnerships and collaborations

Gain insights into regulatory developments and market innovations

These interactions are essential for companies and researchers aiming to stay competitive in a rapidly evolving technological landscape.

Monterey: An Ideal Venue for Innovation

The Monterey Marriott offers a centrally located, well-equipped venue that complements the high-level technical content of the fair. Its modern facilities, combined with Monterey’s scenic surroundings, create an inspiring environment for learning, networking, and innovation.

Driving the Future of Semiconductor Technology

SPIE Photomask Technology + EUV Lithography remains a cornerstone event for the photomask and lithography industry. By showcasing the latest tools, technologies, and processes, and by connecting industry leaders with academic researchers and emerging talent, the event highlights how innovation continually pushes the boundaries of microelectronics.

From advanced wafer processing to EUV lithography breakthroughs, the fair demonstrates the dynamic evolution of the field, offering attendees unparalleled insights, professional connections, and opportunities to influence the future of semiconductor technology.